Rice University

Shared Equipment Authority

Nanofab Clean Room: Mask Aligner (EVG 620)

Location: 
Nanofabrication Cleanroom (Abercrombie A137)

THIS INSTRUMENT IS NOW SCHEDULED EXCLUSIVELY THROUGH FOM: https://fom.rice.edu/fom/

The EVG 620 system offers robust semi-automatic photolithography processing for substrates ranging from small dies/pieces to 4" wafers and for masks either 4" or 5" square. 

Includes automatic WEC, multiple contact modes (soft, hard, vac, vac+hard), several exposure modes (including proximity and large gap), as well as both topside and backside optics to accomodate numerous alignment needs.

Additionally, a manually-instered filter for use with certain SU-8 resist processes is available (Omega Optical PL-360LP).

Off-center work with small dies can be accommodated using an ad hoc solution; contact cleanroom manager for further details.

Notifications: 
This is a closed group. Only a group administrator can add you.
This is a closed group. Only a group administrator can add you.
Use Prime hours: 
No
Max Weekly Hours: 
0
Max Daily Hours: 
0
Training Contact: 
Tim Gilheart (gilheart-at-rice.edu), Cleanroom Manager. Training consists of instruction on proper usage of this instrument, *not* in photolithography methods. If schedules permit (and they rarely do), there may be an option for instruction in basic photolithography methods, at a rate of $70/hr for internal users. Training may also be conducted by a veteran user, with permission from the cleanroom manager.
Rice U Fee: 
$5/exposure
Non-Commercial / Academic Fee: 
$7.85/exposure
Corporate / Commercial Fee: 
$25/exposure
Maintenance: