SE imaging, e-beam lithography
Training consists of 2-3, 2 hour sessions spread out over 3 weeks. To begin training, contact a super-user or Gang Liang(firstname.lastname@example.org ext 3626). Once training begins, you may request access to the room from Gang Liang. Specifically, key card access is required.
Used for compositional and topographical imaging. The 6500F has a high speed electrostatic beam blanker and is configured for electron beam lithography via the Nabity NPGS system. Lithography resolution is approximately 20 nm.